Title:
SUBSTRATE TRANSFER MECHANISM, PHOTOETCHING MACHINE AND SUBSTRATE TRANSFER METHOD
Document Type and Number:
WIPO Patent Application WO/2019/137497
Kind Code:
A1
Abstract:
Disclosed are a substrate transfer mechanism, a photoetching machine and a substrate transfer method, wherein the substrate transfer mechanism comprises a base (1), a rotation driving unit (2), a lifting driving unit (4) and a substrate carrier (3). The rotation driving unit (2) is arranged on the base (1), the substrate carrier (3) is arranged on the rotation driving unit (2), the lifting driving unit (4) is located below the substrate carrier (3), and the lifting driving unit (4) rotates along with the substrate carrier (3). The lifting driving unit (4) comprises a lifting driving motor (45a), ejection pins (43a, 43b, 43c) and a lifting guiding module (44a), the lifting driving motor (45a) driving the ejection pins (43a, 43b, 43c) to pass through the substrate carrier (3) to perform lifting, and the lifting guiding module (44a) directing a lifting direction of the ejection pins (43a, 43b, 43c). The substrate transfer mechanism can realize a large-angle rotation of a substrate, and has high transfer precision and efficiency, high reliability, a compact structure, a small spatial occupied size, and almost has no transfer lifting redundant stroke and transfer impact risk, and has high transfer security.
Inventors:
WU WENJUAN (CN)
Application Number:
PCT/CN2019/071447
Publication Date:
July 18, 2019
Filing Date:
January 11, 2019
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
H01L21/683
Foreign References:
| CN205176483U | 2016-04-20 | |||
| CN103901735A | 2014-07-02 | |||
| CN106338890A | 2017-01-18 | |||
| CN101702404A | 2010-05-05 | |||
| JPH11233601A | 1999-08-27 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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