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Title:
LIQUID CHEMICAL AND PRODUCTION METHOD FOR LIQUID CHEMICAL
Document Type and Number:
WIPO Patent Application WO/2019/138959
Kind Code:
A1
Abstract:
The present invention addresses the issue of providing a liquid chemical having excellent defect suppression performance even when used in a resist process using EUV exposure. The present invention also addresses the problem of providing a production method for the liquid chemical. This liquid chemical contains an organic solvent and metal-containing particles that contain metal atoms. Among the metal-containing particles, the number of particles that are metal nanoparticles having a particle size of 0.5–17 nm is 1.0 × 101–1.0 × 109/cm3 per unit volume of liquid chemical.

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Inventors:
KAMIMURA TETSUYA (JP)
Application Number:
PCT/JP2019/000041
Publication Date:
July 18, 2019
Filing Date:
January 07, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/16; G03F7/038; G03F7/039; G03F7/09; G03F7/32
Domestic Patent References:
WO2017170428A12017-10-05
Foreign References:
JP2002062667A2002-02-28
JP2016073922A2016-05-12
JP2012047896A2012-03-08
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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