Title:
LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/199604
Kind Code:
A1
Abstract:
Provided is a liquid treatment apparatus or the like capable of safely and stably treating a liquid with atmospheric-pressure low-temperature plasma. A liquid treatment apparatus (1) comprises a first electrode (14a) and a second electrode (14b) that are provided so as to face each other, with a dielectric layer interposed therebetween, across a tubular space through which a gas to be treated is circulated and that are sealed inside a main body portion (12) defining the tubular space, a power supply (30) that applies a voltage signal that changes with time between the first electrode (14a) and the second electrode (14b) to generate plasma in the tubular space, and an aspirator (20) that is connected to the tubular space at a position at a predetermined distance from the outlet of the gas in the tubular space, wherein the liquid to be mixed with the gas flows so as to pass through the aspirator (20), and the gas treated by the plasma in the tubular space is sucked into and mixed with the liquid by the reduced pressure caused by the flowing liquid.
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Inventors:
MIYAZAKI HIDETAKA (JP)
Application Number:
PCT/JP2023/006267
Publication Date:
October 19, 2023
Filing Date:
February 21, 2023
Export Citation:
Assignee:
JAPAN INST OF FUTURE SCIENCE INC (JP)
International Classes:
H05H1/30; C02F1/50
Domestic Patent References:
| WO2016017456A1 | 2016-02-04 |
Foreign References:
| JP2013129544A | 2013-07-04 | |||
| JP2013519188A | 2013-05-23 | |||
| JPH05202481A | 1993-08-10 | |||
| JP7034388B1 | 2022-03-11 | |||
| JP6818952B1 | 2021-01-27 |
Attorney, Agent or Firm:
KATO Ryuta et al. (JP)
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