LIQUID TREATMENT DEVICE AND LIQUID TREATMENT METHOD

WIPO Patent Application WO/2013/129252

A1

This liquid treatment device is connected to a treatment liquid supply nozzle for supplying a treatment liquid to a substrate to be treated, and is provided with: a supply line which connects a treatment liquid holding vessel and said treatment liquid supply nozzle; a filter device provided in the supply line; a pump on the secondary side of the filter device; a circulation line which connects the discharge side of the pump and the suction side of the filter device; a supply control valve provided in the supply line on the secondary side of the pump; a circulation control valve provided in the circulation line; and a control device which controls the pump, supply control valve and circulation control valve. By means of the control device, when supply of the treatment liquid from the treatment liquid supply nozzle to the substrate to be treated is stopped by closing the supply control valve, the circulation control valve is opened, the pump is driven, and the treatment liquid is circulated between the circulation line and the supply line having the filter device.

YOSHIHARA KOUSUKE (JP)
ICHINO KATSUNORI (JP)
FURUSHO TOSHINOBU (JP)
SASA TAKASHI (JP)
TSUCHIYA KATSUHIRO (JP)
TERASHITA YUICHI (JP)
TAKEGUCHI HIROFUMI (JP)

PCT/JP2013/054517

September 06, 2013

February 22, 2013

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TOKYO ELECTRON LTD (JP)

H01L21/027; B01D19/00; B05C11/10; G03F7/30

JP2000120530A	2000-04-25
JP2003197513A	2003-07-11
JP2010135535A	2010-06-17
JPH02281727A	1990-11-19
JPH10180173A	1998-07-07
JPH11147068A	1999-06-02

KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)

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