Title:
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO2005064405
Kind Code:
A3
Abstract:
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the space and between the barrier member (10) and the substrate (W).
Inventors:
VAN SANTEN HELMAR (NL)
KOLESNYCHENKO ALEKSEY YURIEVIC (NL)
KOLESNYCHENKO ALEKSEY YURIEVIC (NL)
Application Number:
PCT/EP2004/014282
Publication Date:
March 09, 2006
Filing Date:
December 15, 2004
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
VAN SANTEN HELMAR (NL)
KOLESNYCHENKO ALEKSEY YURIEVIC (NL)
VAN SANTEN HELMAR (NL)
KOLESNYCHENKO ALEKSEY YURIEVIC (NL)
International Classes:
G03F7/20
Domestic Patent References:
| WO1999049504A1 | 1999-09-30 |
Other References:
See also references of EP 1697799A2
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