LITHOGRAPHIC APPARATUS HAVING A DEBRIS-MITIGATION SYSTEM, A SOURCE FOR PRODUCING EUV RADIATION HAVING A DEBRIS MITIGATION SYSTEM AND A METHOD FOR MITIGATING DEBRIS

WIPO Patent Application WO2005064401

A3

A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

BANINE VADIM YEVGENYEVICH (NL)
BAKKER LEVINUS PIETER (NL)
MOORS JOHANNES HUBERTUS JOSEPH (NL)
IVANOV VLADIMIR VITALEVITCH (RU)
ZUKAVISHVILI GIVI GEORGIEVITCH (RU)
VEEFKIND ABRAHAM (NL)

PCT/NL2004/000928

September 29, 2005

December 31, 2004

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ASML NETHERLANDS BV (NL)
BANINE VADIM YEVGENYEVICH (NL)
BAKKER LEVINUS PIETER (NL)
MOORS JOHANNES HUBERTUS JOSEPH (NL)
IVANOV VLADIMIR VITALEVITCH (RU)
ZUKAVISHVILI GIVI GEORGIEVITCH (RU)
VEEFKIND ABRAHAM (NL)

G03F7/20; (IPC1-7): G03F7/20

WO2003087867A2

2003-10-23

EP1223468A1	2002-07-17
US20030190012A1	2003-10-09

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