Title:
LITHOGRAPHY DEVICE USING ELECTRONIC LAYER IN VACUUM SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/195799
Kind Code:
A1
Abstract:
The present invention relates to a device for preventing the adsorption of fine particles onto a mask in a lithography device using a vacuum system and, more specifically, to an extreme ultraviolet lithography device that does not use a pellicle in membrane form. An embodiment of the lithography device according to the present invention comprises: a light-source-unit chamber in which a light source for lithography is disposed; a substrate-unit chamber in which is disposed a substrate on which lithography processing is performed by the light source for lithography; a connection unit which connects the light-source-unit chamber and the substrate-unit chamber and through which light generated by the light source for lithography travels; and a barrier module that is mounted to at least one of the connection unit, the light-source-unit chamber adjacent to the connection unit, and the substrate-unit chamber adjacent to the connection unit, to prevent particles present in the light-source unit chamber from moving to the substrate-unit chamber, wherein the barrier module is an electrical potential barrier, not a physical barrier.
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Inventors:
KIM KI BUM (KR)
Application Number:
PCT/KR2023/004667
Publication Date:
October 12, 2023
Filing Date:
April 06, 2023
Export Citation:
Assignee:
DERKWOO SEMITECH CO LTD (KR)
International Classes:
G03F7/20
Foreign References:
| KR20180067175A | 2018-06-20 | |||
| KR20070007848A | 2007-01-16 | |||
| KR20020016564A | 2002-03-04 | |||
| JP2004332115A | 2004-11-25 | |||
| KR20090052274A | 2009-05-25 |
Attorney, Agent or Firm:
SU INTELLECTUAL PROPERTY (KR)
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