Title:
PARTICLE TRANSFER BLOCKING DEVICE AND LITHOGRAPHY DEVICE WHICH USE ELECTRON LAYER HAVING ELECTROSTATIC TRAP IN VACUUM SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/195800
Kind Code:
A1
Abstract:
The present invention relates to a device for preventing fine particles generated in a vacuum system from being adsorbed by a semiconductor substrate and a sample or a mask in a lithography device using the vacuum system, and, more specifically, to an extreme ultraviolet lithography device that does not use a membrane type pellicle. In one embodiment, a particle transfer blocking device according to the present invention comprises: a vacuum chamber in which an accommodation part is formed; a barrier module provided inside the vacuum chamber so as to divide the accommodation part of the vacuum chamber into a first region and a second region; and a particle capture module, which is provided inside the vacuum chamber and captures particles in the chamber, wherein the barrier module is not a physical barrier but an electrical potential barrier for preventing particles located in the first region from transferring to the second region.
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Inventors:
KIM KI BUM (KR)
Application Number:
PCT/KR2023/004668
Publication Date:
October 12, 2023
Filing Date:
April 06, 2023
Export Citation:
Assignee:
DERKWOO SEMITECH CO LTD (KR)
International Classes:
G03F7/20
Foreign References:
| KR20180067175A | 2018-06-20 | |||
| KR20070007848A | 2007-01-16 | |||
| KR20020016564A | 2002-03-04 | |||
| JP2004332115A | 2004-11-25 | |||
| KR20090052274A | 2009-05-25 |
Attorney, Agent or Firm:
SU INTELLECTUAL PROPERTY (KR)
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