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Title:
LITHOGRAPHY ORIGINAL PLATE, PLATEMAKING METHOD FOR LITHOGRAPHY PLATE, ORGANIC POLYMER PARTICLES, AND PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/230412
Kind Code:
A1
Abstract:
Provided are: a lithography original plate having an image-recording layer on a hydrophilic support, the image-recording layer containing organic polymer particles, and the organic polymer particles being a reaction product obtained by reacting an aromatic polyvalent isocyanate compound having the structure represented by formula PO, with at least water; a platemaking method for a lithography plate having outstanding printing resistance when a UV-curable ink is used in printing; novel organic polymer particles; and a resin composition containing the organic polymer particles.

Inventors:
NOZAKI ATSUYASU (JP)
ARAKI KENJIRO (JP)
Application Number:
PCT/JP2018/021722
Publication Date:
December 20, 2018
Filing Date:
June 06, 2018
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B41N1/14; C08G18/00; C08G18/10; C08G18/48; C08G18/66; C08G18/76; C08G18/81; G03F7/00; G03F7/004; G03F7/027
Domestic Patent References:
WO2016047309A12016-03-31
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See also references of EP 3640039A4
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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