Title:
LITHOGRAPHY ORIGINAL PLATE, PLATEMAKING METHOD FOR LITHOGRAPHY PLATE, ORGANIC POLYMER PARTICLES, AND PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/230413
Kind Code:
A1
Abstract:
Provided are: a lithography original plate having an image-recording layer on a hydrophilic support, the image-recording layer containing organic polymer particles, and the organic polymer particles having a branched chain which includes a polymerizable group and a ligand, the chain length between the polymerizable group and the ligand in the branched chain being at least 30; a platemaking method for lithography plates using said lithography original plate; organic polymer particles; and a photosensitive resin composition containing the organic polymer particles.
Inventors:
NOZAKI ATSUYASU (JP)
Application Number:
PCT/JP2018/021723
Publication Date:
December 20, 2018
Filing Date:
June 06, 2018
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B41N1/14; C08G18/67; C08L75/04; G03F7/00; G03F7/004; G03F7/027
Domestic Patent References:
| WO2017135084A1 | 2017-08-10 |
Foreign References:
| JP2002029162A | 2002-01-29 | |||
| JP2006103309A | 2006-04-20 | |||
| JP2016155271A | 2016-09-01 | |||
| US20040234890A1 | 2004-11-25 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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