Title:
LITHOGRAPHY USING ACHROMATIC FRESNEL OPTICS
Document Type and Number:
WIPO Patent Application WO2003042760
Kind Code:
A3
Abstract:
A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.
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Inventors:
YUN WENBING (US)
WANG YUXIN (US)
NILL KENNETH W (US)
WANG YUXIN (US)
NILL KENNETH W (US)
Application Number:
PCT/US2002/035514
Publication Date:
October 02, 2003
Filing Date:
November 05, 2002
Export Citation:
Assignee:
XRADIA INC (US)
YUN WENBING (US)
WANG YUXIN (US)
NILL KENNETH W (US)
YUN WENBING (US)
WANG YUXIN (US)
NILL KENNETH W (US)
International Classes:
G02B3/08; G02B27/44; G03F7/20; (IPC1-7): G03F7/20
Foreign References:
| US5161059A | 1992-11-03 | |||
| EP1006400A2 | 2000-06-07 | |||
| US5453880A | 1995-09-26 | |||
| US5349471A | 1994-09-20 | |||
| US6285737B1 | 2001-09-04 | |||
| US20020005938A1 | 2002-01-17 |
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