Title:
MACHINE VISION SYSTEM FOR SUBSTRATE ALIGNMENT AND ALIGNMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/019277
Kind Code:
A1
Abstract:
A machine vision system for substrate alignment, comprising first and second illumination light sources (11, 12), first and second reflecting mirrors (21, 22), first and second objective lenses (31, 32) and first and second detectors (41, 42). The first and second illumination light sources, the first and second reflecting mirrors, the first and second objective lenses and the first and second detectors are symmetrical about an X axis, illumination light emitted by the first and the second illumination light sources is irradiated onto a corresponding substrate (1, 2) for reflection, and is projected onto the corresponding detector for detection after being amplified by the corresponding objective lens. Also disclosed is an alignment device. The first and second illumination light sources, the first and second reflecting mirrors, the first and second objective lenses and the first and second detectors are symmetrical about an X axis, thus greatly reducing the occupancy volume of a machine vision system in the direction of a lens cone, enlarging the detection range of the machine vision system, and improving the alignment efficiency and precision.
Inventors:
ZHU ZHI (CN)
HUO ZHIJUN (CN)
HUO ZHIJUN (CN)
Application Number:
PCT/CN2017/094769
Publication Date:
February 01, 2018
Filing Date:
July 27, 2017
Export Citation:
Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD (CN)
International Classes:
H01L21/68
Foreign References:
| TW201423893A | 2014-06-16 | |||
| CN105023871A | 2015-11-04 | |||
| CN102881621A | 2013-01-16 | |||
| CN105914171A | 2016-08-31 | |||
| JPS63166228A | 1988-07-09 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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