Title:
MAINTAINING THE DIMENSIONS OF FEATURES BEING ETCHED ON A LITHOGRAPHIC MASK
Document Type and Number:
WIPO Patent Application WO2004102793
Kind Code:
A3
Abstract:
An apparatus for etching a metal-containing material of a lithographic mask has a chamber with a support for supporting the mask inside the chamber. Over the metal-containing material, the mask comprises a resist layer having features with sidewalls. A gas distributor, gas energizer, and gas exhaust are provided. A controller is provided that is adapted to control one or more of the gas distributor, gas energizer, and gas exhaust to (i) deposit a sacrificial coating on the sidewalls of the features in the resist layer, and (ii) etch the metal-containing material of the mask. Coincidental etching of the sidewalls of the features in the resist layer overlying the metal-containing material is reduced by the sacrificial coating formed thereon.
Inventors:
KOENIG ALFRED WOLFGANG
HAMAKER HENRY CHRISTOPHER
SCHOENLEBER WALTER
HAMAKER HENRY CHRISTOPHER
SCHOENLEBER WALTER
Application Number:
PCT/US2004/014459
Publication Date:
May 06, 2005
Filing Date:
May 06, 2004
Export Citation:
Assignee:
APPLIED MATERIAL INC (US)
International Classes:
H01L21/311; (IPC1-7): G03F1/14; G03F7/40
Foreign References:
| US5447598A | 1995-09-05 | |||
| EP0706088A1 | 1996-04-10 | |||
| US4613400A | 1986-09-23 | |||
| US20020084257A1 | 2002-07-04 |
Other References:
BUIE M J ET AL: "Chrome etch for <0.13 [mu]m advanced reticle production", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 4562, October 2001 (2001-10-01), pages 633 - 640, XP002310310, ISSN: 0277-786X
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