Title:
MANUFACTURING METHOD OF ARRAY SUBSTRATE, AND ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/169885
Kind Code:
A1
Abstract:
A manufacturing method of an array substrate comprises: patterning a photoresist layer (24, 160) to form a first zone (251, Z1), a second zone (252, Z2) and a third zone (253, Z3); and patterning a source/drain electrode layer (23, 150) and a semiconductor layer (130, 140) to form a source (15a), a drain (15b) and a channel region corresponding to portions covered by the first zone (251, Z1), the second zone (252, Z2) and the third zone (253, Z3).
Inventors:
CHO ENTSUNG (CN)
MO QIONGHUA (CN)
MO QIONGHUA (CN)
Application Number:
PCT/CN2018/113606
Publication Date:
September 12, 2019
Filing Date:
November 02, 2018
Export Citation:
Assignee:
HKC CORP LTD (CN)
CHONGQING HKC OPTOELECTRONICS TECH CO LTD (CN)
CHONGQING HKC OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
H01L21/77; H01L27/12
Foreign References:
| CN102148259A | 2011-08-10 | |||
| CN102148259A | 2011-08-10 | |||
| CN101149541A | 2008-03-26 | |||
| CN101149541A | 2008-03-26 | |||
| CN108417583A | 2018-08-17 | |||
| CN108447821A | 2018-08-24 | |||
| CN107331619A | 2017-11-07 |
Attorney, Agent or Firm:
CENFO INTELLECTUAL PROPERTY AGENCY (CN)
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