Title:
MANUFACTURING METHOD FOR GAS BARRIER FILM, AND ELECTRONIC MEMBER OR OPTICAL MEMBER PROVIDED WITH GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2013/081003
Kind Code:
A1
Abstract:
The present invention pertains to: a manufacturing method for a gas barrier film having at least a substrate comprising a synthetic resin, and a gas barrier layer formed on the substrate, said manufacturing method characterized by having steps 1 and 2 below; and an electronic member or optical member provided with the gas barrier film obtained by means of the manufacturing method. In the gas barrier film obtained by means of the present invention, a problem of adhesion failure between the gas barrier layer and substrate does not occur even under high temperature and high humidity conditions. [Step 1] A silicon-based polymer compound solution, which contains a silicon-based polymer compound and an organic solvent, is applied to the substrate, and a layer containing the silicon-based polymer compound is formed by drying the coating film of the silicon-based polymer compound solution that was obtained by heating. The gel fraction of the substrate, which is measured when a combination of the substrate and organic solvent is obtained by immersing the substrate in the organic solvent for 72 hours at 23°C, is 70% to less than 98%. [Step 2] The gas barrier layer is formed by carrying out plasma processing on the layer containing the silicon-based polymer compound that was formed.
Inventors:
IWAYA WATARU (JP)
ITO MASAHARU (JP)
KONDO TAKESHI (JP)
ITO MASAHARU (JP)
KONDO TAKESHI (JP)
Application Number:
PCT/JP2012/080736
Publication Date:
June 06, 2013
Filing Date:
November 28, 2012
Export Citation:
Assignee:
LINTEC CORP (JP)
International Classes:
B05D7/24; B05D3/04; B32B9/00; B32B27/00; B32B27/16
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Other References:
See also references of EP 2786808A4
Attorney, Agent or Firm:
OHISHI HARUHITO (JP)
Haruhito Oishi (JP)
Haruhito Oishi (JP)
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Claims: