Title:
MANUFACTURING METHOD OF THIN FILM TRANSISTOR ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/033595
Kind Code:
A1
Abstract:
Provided is a manufacturing method of a thin film transistor array substrate. In a third photomasking process, a hydrophobic treatment is performed on a surface of a photoresist to form a hydrophobic group (110, 210). Existence of the hydrophobic group (110, 210) prevents a transparent metallic solution and an OLED material from covering the surface of the photoresist, such that the photoresist can be removed easily, thereby improving photoresist removal efficiency and efficiency of a manufacturing process. Existence of the photoresist enables the OLED material to form a fixed pattern (212), thereby saving a photomasking process, and reducing manufacturing costs.
Inventors:
XU HONGYUAN (CN)
Application Number:
PCT/CN2017/111248
Publication Date:
February 21, 2019
Filing Date:
November 16, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L27/12; G03F7/26
Foreign References:
| CN1945813A | 2007-04-11 | |||
| CN102543861A | 2012-07-04 | |||
| CN102054768A | 2011-05-11 | |||
| CN106067478A | 2016-11-02 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
Download PDF: