Title:
MANUFACTURING PROCESS FOR BULK ACOUSTIC RESONATOR, AND BULK ACOUSTIC RESONATOR
Document Type and Number:
WIPO Patent Application WO/2022/061835
Kind Code:
A1
Abstract:
Disclosed is a manufacturing process for a bulk acoustic resonator, the process comprising: making an acoustic mirror on a substrate; making, on the substrate, a bottom electrode layer for covering the acoustic mirror; chemically treating a peripheral part of the bottom electrode layer to form a modified layer, wherein the modified layer surrounds the bottom electrode layer; making a piezoelectric layer on the bottom electrode layer; and making a top electrode layer on the piezoelectric layer. Further disclosed is a bulk acoustic resonator, comprising a substrate, an acoustic mirror formed on the substrate, and a bottom electrode layer, a piezoelectric layer and a top electrode layer, which are sequentially formed on the substrate with the acoustic mirror, wherein part of the bottom electrode layer that is close to an edge of the acoustic mirror is chemically treated to form a modified layer. The electric field intensity between electrodes outside an effective working area is weakened or eliminated by means of forming the modified layer, and the electrodes cannot excite the piezoelectric layer therebetween to generate mechanical waves, thereby inhibiting parasitic oscillation of the resonator, and also greatly simplifying the wiring of a top electrode.
Inventors:
LI LINPING (CN)
SHENG JINGHAO (CN)
JIANG ZHOU (CN)
SHENG JINGHAO (CN)
JIANG ZHOU (CN)
Application Number:
PCT/CN2020/118175
Publication Date:
March 31, 2022
Filing Date:
September 27, 2020
Export Citation:
Assignee:
HANGZHOU XINGHE TECH CO LTD (CN)
International Classes:
H03H9/02; H03H3/02; H03H9/17
Foreign References:
| CN111200414A | 2020-05-26 | |||
| CN103290367A | 2013-09-11 | |||
| CN111294010A | 2020-06-16 | |||
| CN102916674A | 2013-02-06 | |||
| CN109217842A | 2019-01-15 | |||
| CN109361373A | 2019-02-19 | |||
| US20140118088A1 | 2014-05-01 |
Other References:
ALSOLAMI ABDULRAHMAN; ZAMAN ADNAN; RIVERA IVAN FERNANDO; BAGHELANI MASOUD; WANG JING: "Improvement of Deep Reactive Ion Etching Process For Motional Resistance Reduction of Capacitively Transduced Vibrating Resonators", IEEE SENSORS LETTERS, IEEE, vol. 2, no. 1, 1 March 2018 (2018-03-01), pages 1 - 4, XP011677597, DOI: 10.1109/LSENS.2018.2797076
Attorney, Agent or Firm:
XIAMEN FEBE INTELLECTUAL PROPERTY AGENCY GP (CN)
Download PDF:
Previous Patent: COPPER PARTICLE SOLDER PASTE, AND PREPARATION METHOD AND SINTERING METHOD THEREFOR
Next Patent: POSITIONING METHOD AND DEVICE
Next Patent: POSITIONING METHOD AND DEVICE