Title:
MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK HAVING RESIST LAYER, AND METHOD FOR MANUFACTURING TRANSFER MASK
Document Type and Number:
WIPO Patent Application WO/2017/086196
Kind Code:
A1
Abstract:
Provided is a mask blank having a resist layer and capable of suppressing charging-up during irradiation with electron beams. A mask blank (10) having a resist layer is provided with: a substrate (11) having a thin film (12); a resist layer (13) formed on a surface of the thin film (12); and a conductive layer (16) formed on the resist layer (13). The conductive layer (16) has: a first metal layer (14) mainly made of aluminum; and a second metal layer (15) made of metal other than aluminum. The first metal layer (14) is provided closer to the resist layer (13) than the second metal layer (15).
Inventors:
HIROMATSU TAKAHIRO (JP)
SHISHIDO HIROAKI (JP)
SHIBAYAMA SEISHI (JP)
SHISHIDO HIROAKI (JP)
SHIBAYAMA SEISHI (JP)
Application Number:
PCT/JP2016/082927
Publication Date:
May 26, 2017
Filing Date:
November 07, 2016
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/40; G03F7/039; G03F7/11
Foreign References:
| JPH02252231A | 1990-10-11 | |||
| JPH03261953A | 1991-11-21 | |||
| JPH07152140A | 1995-06-16 | |||
| JP2000098582A | 2000-04-07 | |||
| JP2003107674A | 2003-04-09 |
Attorney, Agent or Firm:
IKEDA, Noriyasu et al. (JP)
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