Title:
MASK AND CORRECTION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2013/185401
Kind Code:
A1
Abstract:
A correction method of a mask (30). The method comprises: selecting a reference region (43) in a schematic pattern of a mask template (40), wherein the reference region (43) is corresponding to a complementary shading region (33) of the mask (30); forming a repair region (21) on a member that can be hollowed out (20) according to the reference region (43), and forming a hollow region (23) in the repair region (21) of the member that can be hollowed out (20), wherein the hollow region (23) is corresponding to the complementary shading region (33); attaching the member that can be hollowed out (20) onto the mask (30), and making the hollow region (23) correspond to the complementary shading region (33); coating a shading material on the member that can be hollowed out (20) to form a shading layer (35) on the complementary shading region (33). Also disclosed is a mask (30).
Inventors:
MA JIAXING (CN)
Application Number:
PCT/CN2012/078669
Publication Date:
December 19, 2013
Filing Date:
July 16, 2012
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGYCO LTD (CN)
MA JIAXING (CN)
MA JIAXING (CN)
International Classes:
G03F7/12; G03F1/00; G03F7/20; G02F1/133
Domestic Patent References:
| WO1981003628A1 | 1981-12-24 |
Foreign References:
| US20040224238A1 | 2004-11-11 | |||
| CN101154029A | 2008-04-02 | |||
| EP0961168A1 | 1999-12-01 | |||
| CN101105622A | 2008-01-16 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
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