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Title:
MASK, DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/218413
Kind Code:
A1
Abstract:
A mask (M), a display substrate and a manufacturing method, and a display device. The present invention can improve the yield of the display device. The mask (M) is used for manufacturing a pixel defining layer (6) of the display substrate, comprises a first light-transmitting pattern (M2) and a first light-proof pattern (M1), and further comprises a transition structure (M3) located between the first light-transmitting pattern (M2) and the first light-proof pattern (M1), with the transition structure (M3) comprising a plurality of second light-transmitting patterns (M32) and second light-proof patterns (M31), which second light-transmitting patterns and second light-proof patterns are arranged alternately, and the line widths of the second light-transmitting patterns (M32) and the second light-proof patterns (M31) being smaller than the resolution of an exposure machine for performing exposure by using the mask (M).

Inventors:
XU ZHE (CN)
ZHANG WENXUAN (CN)
YOU FEI (CN)
LIAO FEI (CN)
LI CE (CN)
JIANG LONG (CN)
Application Number:
PCT/CN2021/079863
Publication Date:
November 04, 2021
Filing Date:
March 10, 2021
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
CHENGDU BOE OPTOELECT TECH CO (CN)
International Classes:
G03F1/00
Foreign References:
CN111443565A2020-07-24
CN206133181U2017-04-26
CN108986676A2018-12-11
CN104714363A2015-06-17
US20060199114A12006-09-07
CN108761999A2018-11-06
CN104423084A2015-03-18
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)
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