MATERIAL FOR PATTERN FORMATION, APPARATUS FOR PATTERN FORMATION, AND METHOD FOR PATTERN FORMATION

Title:

MATERIAL FOR PATTERN FORMATION, APPARATUS FOR PATTERN FORMATION, AND METHOD FOR PATTERN FORMATION

Document Type and Number:

WIPO Patent Application WO/2006/129564

Kind Code:

A1

Abstract:

This invention provides a material for pattern formation, which, when a highly transparent material is used as a support for the formation of a pattern like a solder resist, can realize a good resist face shape, a higher-definition pattern, and a suitable blue or green color, and an apparatus for pattern formation, comprising the material for pattern formation, and a method for pattern formation using the material for pattern formation. The material for pattern formation is characterized in that the material comprises a support and a photosensitive layer provided on the support, the photosensitive layer is formed of a photosensitive composition comprising a binder, a filler, a polymerizable compound, a heat crosslinking agent, a photopolymerization initiator, and a colorant, the thickness of the photosensitive layer in its part to be exposed remains unchanged after the exposure and development, the minimum energy of light used in the exposure is 0.1 to 200 mJ/cm², the haze value of the photosensitive layer at the exposure wavelength is 0.1 to 40%, and the pattern formed through the exposure and development is blue to green.

More Like This:

JP3698391	ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE AND MANUFACTURE OF LITHOGRAPHIC PRINTING PLATE
JP2023535327	Methods of using compositions comprising carboxylic acid esters, lithographic compositions comprising carboxylic acid esters, and methods of making resist patterns
JPS62209440	PHOTOSENSITIVE MICROCAPSULE AND PHOTOSENSITIVE MATERIAL

Inventors:

IKEDA KIMI (JP)
KAMIKAWA HIROSHI (JP)

Application Number:

PCT/JP2006/310545

Publication Date:

December 07, 2006

Filing Date:

May 26, 2006

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FUJI PHOTO FILM CO LTD (JP)
IKEDA KIMI (JP)
KAMIKAWA HIROSHI (JP)

International Classes:

G03F7/004; G03F7/027; G03F7/033

Foreign References:

JP2005122048A	2005-05-12
JP2005043580A	2005-02-17
JP2000144071A	2000-05-26
JP2004020917A	2004-01-22
JP2000181058A	2000-06-30
JPH0815861A	1996-01-19

Attorney, Agent or Firm:

Hirota, Koichi (NAGARE & ASSOCIATES 4th Floor, Shinjuku TR Building, 2-2-13, Yoyog, Shibuya-ku Tokyo 53, JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: AUTOMATIC PART TEACHING DEVICE

Next Patent: RESIST MATERIAL, AND RESIST MATERIAL FOR ELECTRON BEAM RECORDING