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Title:
MEMBRANE -MEDIATED ELECTROPOLISHING
Document Type and Number:
WIPO Patent Application WO2005042810
Kind Code:
A3
Abstract:
This invention provides a membrane-mediated electropolishing process for polishing and/or planarizing metal work pieces. The work piece is wetted with a low-conductivity fluid. The wetted work piece is contacted with a first side of a charge­selective ion-conducting membrane, wherein the second side contacts a conductive electrolyte solution in electrical contact with a cathode. Current flow between the cathode and the work piece electropolishes metal from the work piece. This process can be used for both pure metals and alloys, and provides several significant advantages over conventional electropolishing processes. This invention also provides an apparatus useful in the membrane-mediated electropolishing process.

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Inventors:
MAZUR STEPHEN (US)
JACKSON CHARLES E JR (US)
Application Number:
PCT/US2004/036021
Publication Date:
October 13, 2005
Filing Date:
November 01, 2004
Export Citation:
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Assignee:
DU PONT (US)
MAZUR STEPHEN (US)
JACKSON CHARLES E JR (US)
International Classes:
B23H5/08; B24B37/04; B24D13/14; C25F3/16; H01L21/321; (IPC1-7): C25F3/16; B23H5/08
Domestic Patent References:
WO2003046263A12003-06-05
WO2003030223A22003-04-10
WO2003092891A12003-11-13
WO2003064734A12003-08-07
Foreign References:
US6527920B12003-03-04
US6653226B12003-11-25
GB516898A1940-01-15
EP1293481A22003-03-19
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