Title:
METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN
Document Type and Number:
WIPO Patent Application WO/2022/034907
Kind Code:
A1
Abstract:
The present invention provides: a metal patterning material which exhibits excellent heat resistance and is suppressed in the formation of a metal thin film on a film surface; an amine compound; a method for forming a metal pattern using these; and an electronic device. The present invention uses a metal patterning material that contains a compound which comprises, in each molecule, an aromatic ring and/or a heteroaromatic ring, a fluorine atom and at least one tertiary amine, wherein: the aromatic ring is composed of at least one ring selected from the group consisting of a monocyclic aromatic ring, a linked aromatic ring and a fused aromatic ring having from 6 to 15 carbon atoms; a fused aromatic ring having 16 or more carbon atoms is not contained; the proportion of carbon atoms directly bonded to a fluorine atom among the carbon atoms that form the aromatic ring and the carbon atoms that form the heteroaromatic ring is 10% or more; the molecular weight is from 500 to 3,000; and the glass transition temperature is 60°C or higher.
Inventors:
MATSUMOTO NAOKI (JP)
KAWASHIMA HIROYUKI (JP)
NOMURA SHINTARO (JP)
KAWASHIMA HIROYUKI (JP)
NOMURA SHINTARO (JP)
Application Number:
PCT/JP2021/029689
Publication Date:
February 17, 2022
Filing Date:
August 11, 2021
Export Citation:
Assignee:
TOSOH CORP (JP)
International Classes:
C23C14/12; C07C211/56; C23C14/04; H01G9/20; H01L51/50; H05B33/26
Foreign References:
| JP2005044791A | 2005-02-17 | |||
| JP2017157633A | 2017-09-07 | |||
| JP2003313547A | 2003-11-06 | |||
| JP2009527096A | 2009-07-23 | |||
| JP2007176921A | 2007-07-12 | |||
| JP2007188854A | 2007-07-26 |
Other References:
MILLER, A.O. FURIN, G.G.: "Reactions of polyfluoroarenes with hexamethyldisilazane and with 1,1,1-trimethyl-N,N-bis(trimethylsilyl) stannaneamine in the presence of caesium fluoride", JOURNAL OF FLUORINE CHEMISTRY, ELSEVIER, NL, vol. 75, no. 2, 1 December 1995 (1995-12-01), NL , pages 169 - 172, XP004020479, ISSN: 0022-1139, DOI: 10.1016/0022-1139(95)03269-6
MATERIALS HORIZONS, vol. 7, 2020, pages 143
MATERIALS HORIZONS, vol. 7, 2020, pages 143
Attorney, Agent or Firm:
SEKIGUCHI Masao et al. (JP)
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