Title:
METAL REMOVAL METHOD USING METAL REMOVAL FILTER FOR REMOVING METAL IMPURITY FROM PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/153967
Kind Code:
A1
Abstract:
[Problem] The present invention addresses the problem of removing a metal impurity from a photosensitive resin composition used in a packaging step during semiconductor device manufacturing and obtaining a highly purified refined material composition, without modifying a polyamic acid ester and while high viscosity is maintained in the photosensitive resin composition. [Solution] A metal removal method for removing a metal impurity from a photosensitive resin composition by filtration using a metal removal filter that has an ultrahigh molecular weight polyethylene porous film and a resin layer disposed so as to at least partially cover the porous film.
Inventors:
YAGUCHI HIROAKI (JP)
SON GUN (JP)
SON GUN (JP)
Application Number:
PCT/JP2022/000512
Publication Date:
July 21, 2022
Filing Date:
January 11, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
B01D61/14; B01D71/26; C08G73/10; G03F7/004
Domestic Patent References:
| WO2019181440A1 | 2019-09-26 | |||
| WO2020080206A1 | 2020-04-23 |
Foreign References:
| JP2011149023A | 2011-08-04 | |||
| JP2021142514A | 2021-09-24 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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