Title:
METAL OR SEMICONDUCTOR MELT REFINEMENT METHOD, AND VACUUM REFINEMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/118249
Kind Code:
A1
Abstract:
An objective of the present invention is, in refining a metal or a semiconductor melt, without impairing refining efficiency, to alleviate wear and tear commensurate with unevenness in a crucible caused by instability in melt flow, and to allow safe operation over long periods of time such that leakages from the crucible do not occur. Provided is a metal or semiconductor melt refining method, in which, by using an AC resistance heating heater as a crucible heating method, the melt is heat retained and mixed by a rotating magnetic field which is generated by the resistance heating heater. The metal or semiconductor melt refinement method and a vacuum refinement device which is optimal for the refinement method are characterized in that, in order that a fluid instability does not occur in the boundary between the melt and the bottom face of the crucible when the melt is rotated by the rotating magnetic field, with a kinematic viscosity coefficient of the melt designated ν (m2/sec), the radius of the fluid surface of the melt designated R (m), and the rotational angular velocity of the melt designated Ω (rad/sec), the operation is carried out such that the value of a Reynolds number (Re) which is defined as Re=R×(Ω/ν)^(1/2) does not exceed 600.
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Inventors:
KISHIDA YUTAKA (JP)
DOHNOMAE HITOSHI (JP)
KONDO JIRO (JP)
GOTO KIYOSHI (JP)
OHASHI WATARU (JP)
DOHNOMAE HITOSHI (JP)
KONDO JIRO (JP)
GOTO KIYOSHI (JP)
OHASHI WATARU (JP)
Application Number:
PCT/JP2012/052647
Publication Date:
August 15, 2013
Filing Date:
February 06, 2012
Export Citation:
Assignee:
NIPPON STEEL MATERIALS CO LTD (JP)
KISHIDA YUTAKA (JP)
DOHNOMAE HITOSHI (JP)
KONDO JIRO (JP)
GOTO KIYOSHI (JP)
OHASHI WATARU (JP)
KISHIDA YUTAKA (JP)
DOHNOMAE HITOSHI (JP)
KONDO JIRO (JP)
GOTO KIYOSHI (JP)
OHASHI WATARU (JP)
International Classes:
C01B33/037
Domestic Patent References:
| WO2008031229A1 | 2008-03-20 |
Foreign References:
| JP2006232658A | 2006-09-07 | |||
| JPH10212113A | 1998-08-11 | |||
| JPH10182138A | 1998-07-07 | |||
| JPH1025190A | 1998-01-27 | |||
| JP2005231956A | 2005-09-02 | |||
| JP2006315879A | 2006-11-24 | |||
| JP2007315879A | 2007-12-06 | |||
| JPH09309716A | 1997-12-02 | |||
| JP2005281085A | 2005-10-13 |
Other References:
J. SZEKELY: "Fluid Flow Phenomena in Material Processing", 1979, ACADEMIC PRESS, pages: 191
UCHIDA ROKAKUHO, REVOLVING MAGNETIC FIELD DEVICES, SHIGEO ASAI, AN INTRODUCTION TO MAGNETIC MATERIALS PROCESSING, 2000
J.R. DAVIS, IEEE TRANS. ELEC. DEV., vol. ED27, 1980, pages 677
N. YUGE ET AL., SOLAR ENERGY MATERIALS AND SOLAR CELLS, vol. 34, 1994, pages 243
H. P. GREENSPAN: "The theory of rotating fluids", 1966, CAMBRIDGE UNIV. PRESS
P. J. THOMAS; F. ZOUESHTIAGH, J. ENG. MATH., vol. 57, 2007, pages 317
P.A. DAVIDSON; J. C. R. HUNT, J. FLUID MECH., vol. 185, 1987, pages 67
H.E. KNOEPFEL: "Magnetic Fields: a comprehensive theoretical treaties and practical use", 2000, WILEY-INTERSCIENCE, pages: 96
See also references of EP 2813471A4
UCHIDA ROKAKUHO, REVOLVING MAGNETIC FIELD DEVICES, SHIGEO ASAI, AN INTRODUCTION TO MAGNETIC MATERIALS PROCESSING, 2000
J.R. DAVIS, IEEE TRANS. ELEC. DEV., vol. ED27, 1980, pages 677
N. YUGE ET AL., SOLAR ENERGY MATERIALS AND SOLAR CELLS, vol. 34, 1994, pages 243
H. P. GREENSPAN: "The theory of rotating fluids", 1966, CAMBRIDGE UNIV. PRESS
P. J. THOMAS; F. ZOUESHTIAGH, J. ENG. MATH., vol. 57, 2007, pages 317
P.A. DAVIDSON; J. C. R. HUNT, J. FLUID MECH., vol. 185, 1987, pages 67
H.E. KNOEPFEL: "Magnetic Fields: a comprehensive theoretical treaties and practical use", 2000, WILEY-INTERSCIENCE, pages: 96
See also references of EP 2813471A4
Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
Kazuya Sasaki (JP)
Kazuya Sasaki (JP)
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