Title:
METASURFACE
Document Type and Number:
WIPO Patent Application WO/2023/136182
Kind Code:
A1
Abstract:
The purpose of the present invention is to provided a metasurface having a low aspect ratio, using a dielectric resin, without increasing the size of a unit. This metasurface comprises a substrate 1 that transmits light, and a plurality of microstructures 2 disposed on the substrate 1 to control the phase distribution of the light, and the plurality of microstructures 2 have two or more varieties of heights. The maximum aspect ratio of the plurality of varieties of microstructures 2 is smaller than the maximum aspect ratio if the plurality of varieties of microstructures 2 were designed so as to generate the same phase difference at the same height.
Inventors:
AWAYA NOBUYOSHI (JP)
NAWATA AKIFUMI (JP)
OGAWA DAIKI (JP)
NAKAMURA TOMONORI (JP)
YANG ZHE (JP)
TANAKA SATORU (JP)
NAWATA AKIFUMI (JP)
OGAWA DAIKI (JP)
NAKAMURA TOMONORI (JP)
YANG ZHE (JP)
TANAKA SATORU (JP)
Application Number:
PCT/JP2022/048663
Publication Date:
July 20, 2023
Filing Date:
December 28, 2022
Export Citation:
Assignee:
SCIVAX CORP (JP)
International Classes:
G02B5/18
Domestic Patent References:
| WO2020210425A1 | 2020-10-15 |
Foreign References:
| US20200174163A1 | 2020-06-04 |
Attorney, Agent or Firm:
OKUDA Noritsugu (JP)
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