METHOD AND APPARATUS FOR LOCATING PRODUCTION MONITORING POINT OF PHOTOMASK, AND ELECTRONIC DEVICE

WIPO Patent Application WO/2024/045204

A1

A method and apparatus for locating a production monitoring point of a photomask, and an electronic device. The method for locating a production monitoring point of a photomask comprises: determining coordinates of one or more target detection areas on a mask layout to be subjected to detection (S1); generating a mask according to the coordinates of the target detection area, wherein the mask has the same size as that of the photomask layout to be subjected to detection, and the mask comprises a hollowed area corresponding to the target detection area (S2); performing a logical operation on the photomask layout to be subjected to detection and the mask, and acquiring a photomask layout of the target detection area according to a result of the logical operation (S3); and according to the photomask layout of the target detection area, acquiring a plurality of production monitoring positions which meet a preset screening condition, and outputting coordinates of the production monitoring positions as production monitoring sites of the photomask layout to be subjected to detection (S4). The efficiency of determining production monitoring sites of a photomask layout can be improved.

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WANG DAWEI (CN)

PCT/CN2022/117069

March 07, 2024

September 05, 2022

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CHANGXIN MEMORY TECH INC (CN)

G03F1/84; G03F9/00

CN109143775A	2019-01-04
CN101295130A	2008-10-29
CN109634053A	2019-04-16
CN114252014A	2022-03-29
US6617080B1	2003-09-09

BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)

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