METHOD AND APPARATUS FOR PRODUCING PROTECTIVE FILM

Title:

METHOD AND APPARATUS FOR PRODUCING PROTECTIVE FILM

Document Type and Number:

WIPO Patent Application WO/2007/032303

Kind Code:

A1

Abstract:

Disclosed is an apparatus for producing a protective film, which comprises a film formation chamber (32), a gas feed port (47) for introducing at least a gas into the film formation chamber (32), an exhaust pump (43) for exhausting the film formation chamber (32), a cryotrap for controlling the exhaust rate of water independently from the exhaust pump (43), and a temperature control unit for controlling the cooling temperature of the cryotrap. By controlling the exhaust rate of water through control of the cooling temperature of the cryotrap, a protective film which is likely to be affected by the partial pressure of water can be stably produced under the same conditions all the time. Consequently, there can be obtained a protective film having sputtering resistance, which is excellent in secondary electron emission characteristics.

Inventors:

OOE YOSHINAO
UETANI KAZUO
SHIOKAWA AKIRA
MIZOKAMI KANAME
KADOU HIROYUKI

Application Number:

PCT/JP2006/317966

Publication Date:

March 22, 2007

Filing Date:

September 11, 2006

Export Citation:

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Assignee:

MATSUSHITA ELECTRIC IND CO LTD (JP)
OOE YOSHINAO
UETANI KAZUO
SHIOKAWA AKIRA
MIZOKAMI KANAME
KADOU HIROYUKI

International Classes:

H01J9/02; C23C14/24; H01J11/12; H01J11/22; H01J11/24; H01J11/26; H01J11/34; H01J11/40; H01J11/02

Foreign References:

JP2000129428A	2000-05-09
JPH04326943A	1992-11-16
JP2003013661A	2003-01-15
JP2001026868A	2001-01-30
JPH06306601A	1994-11-01

Other References: