Title:
METHOD BY WHICH DIGITAL MICROMIRROR DEVICE CONTROLLER FOR HIGH-SPEED EXPOSURE OF FINE LINE WIDTH CONTROLS EXPOSURE IMAGE OUTPUT
Document Type and Number:
WIPO Patent Application WO/2019/035520
Kind Code:
A1
Abstract:
An embodiment relates to a method by which a digital micromirror device (DMD) controller for high-speed exposure of a fine line width controls an exposure image output, the method performing outputting in a virtual frame, in which an exposure image is rotated at an angle between the DMD and a moving direction of the stage, on a stage or mask film virtualized by performing modeling in a memory cell according to an exposure image resolution when a DMD is tilted or a stage is moved with a high-speed mechanism while tilted, and thus a finer line width is implemented than when exposure proceeds by moving a stage at a predetermined slope according to one embodiment without tilting the DMD and with the DMD in parallel as in a conventional method.
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Inventors:
SIM SANG BUM (KR)
IM CHANG MIN (KR)
MOON YOUNG SOUNG (KR)
IM CHANG MIN (KR)
MOON YOUNG SOUNG (KR)
Application Number:
PCT/KR2018/000726
Publication Date:
February 21, 2019
Filing Date:
January 16, 2018
Export Citation:
Assignee:
SDA CO LTD (KR)
International Classes:
G03F7/20
Foreign References:
| KR20170020250A | 2017-02-22 | |||
| KR20160111828A | 2016-09-27 | |||
| KR20100132676A | 2010-12-20 | |||
| KR20110082224A | 2011-07-19 | |||
| JP2007094116A | 2007-04-12 |
Attorney, Agent or Firm:
YOON, Eui-Seoup (KR)
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