Title:
METHOD FOR ETCHING METAL, CONTROL METHOD FOR ETCHING METAL AND APPARATUS THEREOF
Document Type and Number:
WIPO Patent Application WO/2012/071753
Kind Code:
A1
Abstract:
A method for etching metal comprises the following steps: etching a metal film and obtaining an etching termination time of the metal film; obtaining an over-etching time of the metal film by multiplying a constant proportion by the etching termination time; continuously etching the metal film for the over-etching time to complete the etching of metal film. Also disclosed are a control method for etching a metal and an apparatus thereof.
Inventors:
WANG CHIN-WEN (CN)
HE CHENGMING (CN)
HE CHENGMING (CN)
Application Number:
PCT/CN2010/079755
Publication Date:
June 07, 2012
Filing Date:
December 14, 2010
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
WANG CHIN-WEN (CN)
HE CHENGMING (CN)
WANG CHIN-WEN (CN)
HE CHENGMING (CN)
International Classes:
C23F1/02; C23F1/08; H01L21/02
Foreign References:
| JP2004186289A | 2004-07-02 | |||
| CN2112206U | 1992-08-05 | |||
| CN1480995A | 2004-03-10 | |||
| CN1574245A | 2005-02-02 | |||
| US20080041813A1 | 2008-02-21 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
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Claims: