Title:
METHOD FOR FABRICATING DIAMOND FILMS ON NONDIAMOND SUBSTRATES AND RELATED STRUCTURES
Document Type and Number:
WIPO Patent Application WO1994011548
Kind Code:
A3
Abstract:
A method for making an oriented diamond film includes the steps of seeding a face of a nondiamond substrate with diamond particles, and orienting the diamond particles with respect to the substrate by heating the seeded substrate to a predetermined temperature and for a predetermined time to dissolve portions of the diamond particles into the substrate while suppressing graphite formation. Diamond may then be deposited onto the oriented diamond particles by CVD techniques to thereby form an oriented diamond film on the nondiamond substrate. The nondiamond substrate is preferably a single crystal transition metal capable of dissolving carbon. The transition metal is preferably selected from the group consisting of nickel, cobalt, chromium, magnesium, iron, and alloys thereof. For nickel as the substrate material, the temperature for orientation of the diamond particles is preferably about 1200 DEG C., for a time period in the range of about 1 to 15 minutes, and, more preferably, about 1 to 5 minutes. Structures produced by the method are also disclosed and include the absence of a graphite layer between the diamond and the nondiamond substrate.
Inventors:
YANG PEICHUN (US)
ZHU WEI (US)
GLASS JEFFREY T (US)
ZHU WEI (US)
GLASS JEFFREY T (US)
Application Number:
PCT/US1993/010317
Publication Date:
July 21, 1994
Filing Date:
October 28, 1993
Export Citation:
Assignee:
UNIV NORTH CAROLINA STATE (US)
YANG PEICHUN (US)
ZHU WEI (US)
GLASS JEFFREY T (US)
YANG PEICHUN (US)
ZHU WEI (US)
GLASS JEFFREY T (US)
International Classes:
C23C16/02; C23C16/27; C30B25/02; C30B25/18; (IPC1-7): C30B29/04; C30B25/02; C30B25/18
Other References:
NARAYAN ET AL: "enhancement of nucleation and adhesion of diamond films on copper...", JOURNAL OF APPLIED PHYSICS., vol. 71, no. 2, 15 January 1992 (1992-01-15), NEW YORK US, pages 966 - 971
RAMESHAM: "selected diamond seed deposition using electroplated copper", DIAMOND AND RELATED MATERIALS, vol. 1, no. 8, 25 June 1992 (1992-06-25), AMSTERDAM NL, pages 907 - 910
BELTON ET AL: "nucleation of chemical vapor deposited diamond on platinum and nickel substrates", THIN SOLID FILMS, vol. 212, no. 1/2, 15 May 1992 (1992-05-15), LAUSANNE CH, pages 68 - 80
GEIS: "device quality diamond substrates", DIAMOND AND RELATED MATERIALS, vol. 1, no. 5/6, 15 April 1992 (1992-04-15), AMSTERDAM NL
RAMESHAM: "selected diamond seed deposition using electroplated copper", DIAMOND AND RELATED MATERIALS, vol. 1, no. 8, 25 June 1992 (1992-06-25), AMSTERDAM NL, pages 907 - 910
BELTON ET AL: "nucleation of chemical vapor deposited diamond on platinum and nickel substrates", THIN SOLID FILMS, vol. 212, no. 1/2, 15 May 1992 (1992-05-15), LAUSANNE CH, pages 68 - 80
GEIS: "device quality diamond substrates", DIAMOND AND RELATED MATERIALS, vol. 1, no. 5/6, 15 April 1992 (1992-04-15), AMSTERDAM NL
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