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Title:
METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTRATE, AND SYSTEM FOR PROCESSING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/049735
Kind Code:
A1
Abstract:
[Problem] To provide a technique by which good film quality can be achieved when forming a silicon oxide-containing insulation film as a coating film on a substrate. [Solution] A coating solution containing a polysilazane is applied onto a wafer W, the solvent of the coating solution is volatilized, and then the coating film is irradiated with ultraviolet rays in a nitrogen atmosphere before performing a curing process. Dangling bonds are thus generated in silicon which is a pre-hydrolyzed site in the polysilazane. Therefore, the energy required for hydrolysis is reduced, and unhydrolyzed sites are thus reduced even when the temperature of the curing process is set to 350°C. Since efficient dehydration condensation occurs as a result, the degree of crosslinking is improved, and a dense (high-quality) insulation film can be formed. In addition, by forming a protective film on the surface of the coating film after the coating film has been irradiated with ultraviolet rays, the reaction of dangling bonds prior to the curing process can be suppressed, and the film quality of the coating film is improved.

Inventors:
MURAMATSU MAKOTO (JP)
GENJIMA HISASHI (JP)
Application Number:
PCT/JP2018/031810
Publication Date:
March 14, 2019
Filing Date:
August 28, 2018
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/312; B05C9/12; B05C9/14; B05C13/02; B05D1/36; B05D3/02; B05D3/06; B05D7/24; H01L21/76; B05C11/08
Domestic Patent References:
WO2007088908A12007-08-09
Foreign References:
JP2010080709A2010-04-08
JP2010003983A2010-01-07
JPH0799237A1995-04-11
JP2006100299A2006-04-13
JP2012174764A2012-09-10
JPH05186509A1993-07-27
JPH07206410A1995-08-08
JPH10209275A1998-08-07
JPH1140554A1999-02-12
JP2007036067A2007-02-08
JP2008251774A2008-10-16
JP2009076869A2009-04-09
JP2012250181A2012-12-20
JP2013086501A2013-05-13
Attorney, Agent or Firm:
YAYOY PATENT OFFICE (JP)
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