METHOD FOR FORMING MESH-SHAPED FUNCTIONAL PATTERN, MESH-SHAPED FUNCTIONAL PATTERN, AND FUNCTIONAL SUBSTRATE

WIPO Patent Application WO/2015/199201

A1

The purpose of the present invention is to provide a method for forming a mesh-shaped functional pattern in which low visibility can be improved and variations in resistance can be suppressed, a mesh-shaped functional pattern, and a functional substrate. This purpose is achieved by forming a mesh-shaped functional pattern in which parallel line patterns 3, 5 intersect, by applying liquid lines including a functional material to a substrate and causing the functional material to selectively accumulate at edge parts in a drying process, and forming a parallel line pattern 3 configured from two line segments 31, 32, then applying liquid lines including the functional material so that the liquid lines intersect with the parallel line pattern 3 and causing the functional material to selectively accumulate at edge parts in a drying process, and forming a parallel line pattern 5 configured from two line segments 51, 52, an interval between the two line segments 51, 52 constituting the parallel line pattern being adjusted during formation of the mesh-shaped functional pattern so that the expression 0.9 ≤ B/A ≤ 1.1 is satisfied, where A is the average interval in a formation region of the parallel line pattern 3, and B is the average interval outside the formation region.

YAMAUCHI MASAYOSHI (JP)
NIIZUMA NAOTO (JP)
OHYA HIDENOBU (JP)

PCT/JP2015/068414

December 30, 2015

June 25, 2015

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KONICA MINOLTA INC (JP)

B05D1/38; B05D1/26; B05D3/02; H01B5/14; H01B13/00

WO2014030647A1	2014-02-27
WO2015111731A1	2015-07-30

JP2015155086A

2015-08-27

MARUYAMA EIICHI (JP)
Maruyama Eiichi (JP)

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