Title:
METHOD FOR FORMING VENTILATION HOLES IN AN ELECTRODE PLATE
Document Type and Number:
WIPO Patent Application WO/2011/046052
Kind Code:
A1
Abstract:
Provided is a method for forming ventilation holes in an electrode plate, said method including: a surface-roughening step in which the surface of an electrode plate for use in a plasma-processing device is roughened to a centerline average roughness (Ra) between 0.2 μm and 30 μm; and a ventilation-hole forming step in which the roughened surface of the electrode plate is irradiated with laser light having a wavelength between 200 nm and 600 nm and a ventilation hole is formed in the electrode plate so as to penetrate all the way through in the thickness direction thereof. In the ventilation-hole forming step, a circular irradiation area is formed by moving the focal point of the aforementioned laser light in a circle on the surface of the electrode plate. The focal point of the laser light is also moved in the thickness direction of the electrode plate while the aforementioned irradiation area is moved in a circle in a plane parallel to the surface of the electrode plate.
Inventors:
FUJITA SATOSHI (JP)
MATSUDA ATSUSHI (JP)
MATSUDA ATSUSHI (JP)
Application Number:
PCT/JP2010/067528
Publication Date:
April 21, 2011
Filing Date:
October 06, 2010
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
FUJITA SATOSHI (JP)
MATSUDA ATSUSHI (JP)
FUJITA SATOSHI (JP)
MATSUDA ATSUSHI (JP)
International Classes:
H01L21/3065; B23K26/382; C23C16/455
Foreign References:
| JPH1050678A | 1998-02-20 | |||
| JP2008181972A | 2008-08-07 | |||
| JP2002283083A | 2002-10-02 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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