Title:
METHOD FOR GRADED UTILIZATION OF FLUORINE AND SILICON RESOURCES IN PHOSPHATE ORE
Document Type and Number:
WIPO Patent Application WO/2023/202270
Kind Code:
A1
Abstract:
The present description specifically discloses a method for graded utilization of fluorine and silicon resources in phosphate ore. Tail gas containing fluorine and silicon is generated while phosphate ore reacts with sulfuric acid to prepare calcium superphosphate or heavy calcium carbonate or fertilizer-producing phosphoric acid. After the tail gas is absorbed by water, a solution containing HF and H2SiF6 is formed, and the solution is concentrated and filtered to obtain SiO2 and a high-concentration H2SiF6 solution; the high-concentration H2SiF6 solution is subjected to extraction, adsorption and dehydration to obtain crude SiF4 and a solution containing HF and H2SO4; after the crude SiF4 is adsorbed and rectified, SiF4 having a purity of 5N is obtained; moreover, SiF4 enriched with impurities returns to the previous concentrating and filtering step and reacts with the solution containing HF and H2SiF6 to generate H2SiF6 and SiO2. After the H2SO4 solution containing HF is subjected to steam stripping and rectification for separation, high-purity HF and waste sulfuric acid are obtained. The waste sulfuric acid is used for reacting with the foregoing phosphate ore. The method produces zero emissions and zero pollution; moreover, the product system is flexible, and the ratio of three products, i.e. SiF4, SiO2 and HF, is adjustable.
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Inventors:
QUAN XIAOWEI (CN)
Application Number:
PCT/CN2023/081412
Publication Date:
October 26, 2023
Filing Date:
March 14, 2023
Export Citation:
Assignee:
CHTEM LTD (CN)
International Classes:
C01B7/19; C05B17/00; C01B25/222; C01B33/107; C01B33/18
Foreign References:
| CN114988920A | 2022-09-02 | |||
| CN102001666A | 2011-04-06 | |||
| CN102951611A | 2013-03-06 | |||
| CN103803561A | 2014-05-21 | |||
| CN112340703A | 2021-02-09 | |||
| JP2000143227A | 2000-05-23 | |||
| US4457901A | 1984-07-03 |
Attorney, Agent or Firm:
METIS IP (CHENGDU) LLC (CN)
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