Title:
METHOD FOR IMPLEMENTING MERCAPTO-EPOXY DEEP PHOTOCURING AND APPLICATION THEREOF
Document Type and Number:
WIPO Patent Application WO/2020/151527
Kind Code:
A1
Abstract:
The invention discloses a method for implementing mercapto-epoxy deep photocuring and an application thereof. A point light source with a wavelength in the range of 220-400nm is used for irradiating a photocuring composition to generate active species; the photocuring composition is evenly dispersed during the irradiation; the irradiated composition is heated and baked so as to realize mercapto-epoxy deep photocuring. The photocuring composition includes a photocurable epoxy resin, a photocurable mercapto monomer, a photosensitizer, and a photobase generator. According to the present invention, the photocuring composition is uniformly dispersed during the irradiation by ultraviolet light, which is beneficial to generating active species and makes the active species uniformly dispersed in the system, thereby avoiding the difficulty in the curing process for an unirradiated area due to the absence of active species and further avoiding the difficulty in deep curing. The method can obtain the required mercapto-epoxy deep photocuring material according to the actual requirements and the physical model design, thereby solving the problem of difficult deep photocuring for traditional mercapto-epoxy and broadening the application field of photopolymerization technology.
Inventors:
LI ZHIQUAN (CN)
CHEN LI (CN)
CHEN LI (CN)
Application Number:
PCT/CN2020/071868
Publication Date:
July 30, 2020
Filing Date:
January 14, 2020
Export Citation:
Assignee:
UNIV JIANGNAN (CN)
International Classes:
C08G59/66; C08L63/00
Foreign References:
| CN104844564A | 2015-08-19 | |||
| CN106883210A | 2017-06-23 | |||
| CN109825034A | 2019-05-31 | |||
| CN101553549A | 2009-10-07 | |||
| CN107438650A | 2017-12-05 | |||
| US20070034515A1 | 2007-02-15 |
Attorney, Agent or Firm:
HARBIN SHINEIP INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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