Title:
METHOD FOR MANUFACTURING ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/176880
Kind Code:
A1
Abstract:
A method for manufacturing an array substrate, comprising: sequentially forming a first metal layer (2), a gate layer (3), a gate insulating layer (4), a semiconductor layer (5), a second metal layer (6), a source layer (7), and a drain layer (8) on a substrate base (1). Forming the gate layer on the first metal layer comprises: depositing a gate metal layer and performing exposure, development and wet etching; and removing a photoresist layer, metal cations with a chemical corrosion potential less than or equal to that of the first metal layer being added in a stripping liquid. The problem of short circuit is avoided.
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Inventors:
JIANG CHUNSHENG (CN)
WU YUE (CN)
WU YUE (CN)
Application Number:
PCT/CN2017/113328
Publication Date:
October 04, 2018
Filing Date:
November 28, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L21/77
Foreign References:
CN107026120A | 2017-08-08 | |||
CN104952932A | 2015-09-30 | |||
JP2004212818A | 2004-07-29 | |||
CN1875325A | 2006-12-06 | |||
US20040166675A1 | 2004-08-26 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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