Title:
METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2020/093442
Kind Code:
A1
Abstract:
A method for manufacturing an array substrate, and an array substrate. The method for manufacturing an array substrate comprises: first forming, on a base substrate (1), a transparent conductive thin film (101) and a metallic thin film (102) covering the transparent conductive thin film (101), and patterning, by means of one photomask, the transparent conductive thin film (101) and the metallic thin film (102) to form a gate electrode (2) formed by the transparent conductive thin film (101) and the metallic thin film (102) and an array substrate common electrode (3) formed by the transparent conductive thin film (101). The transparent array substrate common electrode (3) can increase the pixel aperture ratio and improve the display effect, and the gate electrode (2) and the array substrate common electrode (3) are still only made from one photomask, without increasing the amount of photomasks, and therefore, the manufacturing cost is relatively low.
Inventors:
ZHU MAOXIA (CN)
XU HONGYUAN (CN)
XU HONGYUAN (CN)
Application Number:
PCT/CN2018/116043
Publication Date:
May 14, 2020
Filing Date:
November 16, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
H01L21/77; H01L27/12
Foreign References:
| CN102543863A | 2012-07-04 | |||
| CN102543863A | 2012-07-04 | |||
| CN102543864A | 2012-07-04 | |||
| CN102543864A | 2012-07-04 | |||
| CN102544029A | 2012-07-04 | |||
| CN102544029A | 2012-07-04 | |||
| CN103887245A | 2014-06-25 | |||
| US20040041954A1 | 2004-03-04 |
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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