METHOD FOR MANUFACTURING PHOTOELECTROMOTIVE FORCE DEVICE AND DEVICE FOR MANUFACTURING PHOTOELECTROMOTIVE FORCE DEVICE

WIPO Patent Application WO/2013/114589

A1

The present invention includes a step for diffusing an impurity element on a surface of a silicon-based substrate (11) and forming an impurity diffusion layer (15), and an etching step for removing the impurity diffusion layer in at least a portion of a first side of the silicon-based substrate, the etching step including an etching fluid supply step for supplying an etching fluid (33) for flowing from a supply position to an edge of the silicon-based substrate, and an air supply step for supplying air (34) to a second side opposite the first side of the silicon-based substrate, in the same direction as the etching fluid and in conjunction with the supplying of the etching fluid in the etching fluid supply step.

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HAMAMOTO SATOSHI (JP)

PCT/JP2012/052276

August 08, 2013

February 01, 2012

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MITSUBISHI ELECTRIC CORP (JP)
HAMAMOTO SATOSHI (JP)

H01L31/18; H01L21/306; H01L31/068

JPH06244167A	1994-09-02
JPH08502148A	1996-03-05
JPH11288903A	1999-10-19
JPH03272140A	1991-12-03
JP2007027492A	2007-02-01
JPH1092712A	1998-04-10
JPH09270400A	1997-10-14
JPH02185032A	1990-07-19
JP2007529912A	2007-10-25

SAKAI, HIROAKI (JP)
Hiroaki Sakai (JP)

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