Title:
METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR
Document Type and Number:
WIPO Patent Application WO/2010/007874
Kind Code:
A1
Abstract:
Disclosed is a method for modifying a first film by using a second film. Particularly disclosed is a method for modifying a first film wherein a pattern can be formed by using a conventional photolithographic process even when the first film to be formed into the pattern contains no acid generator. A composition for forming an acid transfer resin film which is used in the method is also disclosed. The modification method comprises, in the following order, a step (I) of forming a second film (20) containing an acid generator on a first film (10) having an acid-cleavable group, a step (II) of generating an acid by exposing the second film (20) through a mask (30), a step (III) of transferring the acid generated in the second film (20) to the first film (10), and a step (IV) of removing the second film (20).
More Like This:
Inventors:
NISHIKAWA KOUJI (JP)
Application Number:
PCT/JP2009/061886
Publication Date:
January 21, 2010
Filing Date:
June 29, 2009
Export Citation:
Assignee:
JSR CORP (JP)
NISHIKAWA KOUJI (JP)
NISHIKAWA KOUJI (JP)
International Classes:
G03F7/095; G03F7/039; G03F7/11; G03F7/38; H01L21/027
Foreign References:
| JPH08305024A | 1996-11-22 | |||
| JPH07311467A | 1995-11-28 | |||
| JPH07295228A | 1995-11-10 | |||
| JP2006072329A | 2006-03-16 | |||
| JP2006085149A | 2006-03-30 |
Attorney, Agent or Firm:
KOJIMA SEIJI (JP)
Seiji Kojima (JP)
Seiji Kojima (JP)
Download PDF: