Title:
METHOD FOR OPERATING AND MANAGING REVERSE OSMOSIS MEMBRANE DEVICE, AND REVERSE OSMOSIS MEMBRANE TREATMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2017/158887
Kind Code:
A1
Abstract:
The present invention suppresses generation of scale in a reverse osmosis membrane device and continues stable operation for a long period of time even in a low-water-temperature condition (water temperature: 5-10 °C) without requiring pH adjustment or addition of a scale dispersant. The operation of a reverse osmosis membrane device is managed on the basis of the concentration of aluminum ions and/or iron ions in water supplied to and/or concentrated water from a reverse osmosis membrane device. Not only silica, but also coexistent aluminum ions and iron ions have a significant effect on the decrease in flux of a reverse osmosis membrane due to silica scale. The concentration of aluminum ions and/or iron ions in water supplied to and/or concentrated water from the reverse osmosis membrane device must be suitably managed for long-term stabilization of the operation of the reverse osmosis membrane device.
Inventors:
KAMEDA HIDEKUNI (JP)
KOMORI HIDEYUKI (JP)
KOMORI HIDEYUKI (JP)
Application Number:
PCT/JP2016/077636
Publication Date:
September 21, 2017
Filing Date:
September 20, 2016
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
C02F1/44; B01D61/12
Foreign References:
| JP2014188439A | 2014-10-06 | |||
| JP2012183473A | 2012-09-27 | |||
| JPH10128075A | 1998-05-19 | |||
| JP2003326259A | 2003-11-18 | |||
| JP2013154274A | 2013-08-15 | |||
| JP2007245084A | 2007-09-27 | |||
| JPH06304594A | 1994-11-01 | |||
| JP2006095425A | 2006-04-13 | |||
| JP2001129550A | 2001-05-15 |
Other References:
S. SALVADOR COB ET AL.: "Silica and silicate precipitation as limiting factors in high-recovery reverse osmosis operations", JOURNAL OF MEMBRANE SCIENCE, vol. 423-424, 1 December 2012 (2012-12-01), pages 1 - 10, XP055602787, Retrieved from the Internet
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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