Title:
METHOD FOR PREPARING ARRAY SUBSTRATE STRUCTURE, ARRAY SUBSTRATE AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2020/135052
Kind Code:
A1
Abstract:
A method for preparing an array substrate structure, comprising: successively forming a gate, a gate insulating layer, an amorphous silicon layer and a metal layer on a base substrate, and then forming a photolithography mask on the metal layer (S10); etching the metal layer and the amorphous silicon layer outside the coverage area of the photolithography mask (S20); ashing the photolithography mask on the basis of a mixed gas at a preset ratio so as to remove the photolithography mask inside a channel region (S30); and successively etching the metal layer and the amorphous silicon layer, and adding a bias power supply when etching the amorphous silicon layer (S40). An array substrate and a display panel formed by means of the method for preparing the array substrate structure above.
Inventors:
CHO EN-TSUNG (CN)
Application Number:
PCT/CN2019/124560
Publication Date:
July 02, 2020
Filing Date:
December 11, 2019
Export Citation:
Assignee:
HKC CORP LTD (CN)
International Classes:
H01L21/84; H01L27/12
Foreign References:
| CN109786335A | 2019-05-21 | |||
| CN108417583A | 2018-08-17 | |||
| CN109065632A | 2018-12-21 | |||
| US20040229393A1 | 2004-11-18 | |||
| CN101510530A | 2009-08-19 |
Attorney, Agent or Firm:
CENFO INTELLECTUAL PROPERTY AGENCY (CN)
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