METHOD FOR PREPARING ARTICLE COVERED WITH LIGHT ABSORPTION PATTERN FILM AND ARTICLE COVERED WITH LIGHT ABSORPTION PATTERN FILM

WIPO Patent Application WO/2001/030716

A1

A method for preparing an article covered with a light absorption pattern film having a spectral distribution of a transmitted light corresponding to a pattern of a photomask, which comprises applying a liquid material for a light absorption film which contains a raw material for a silicon oxide, a raw material for a titanium oxide containing titanium oxide fine particles and a raw material for fine gold particles to the surface of a substrate, arranging the photomask over the applied coating film, irradiating an ultraviolet light to the coating film and then heating the film. The method can be used for preparing various articles covered with light absorption pattern films which have a variety of spectral distributions of a transmitted light, while maintaining the reflectance of visible lights at a low level.

KAWAZU MITSUHIRO (JP)

PCT/JP2000/007413

May 03, 2001

October 24, 2000

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NIPPON SHEET GLASS CO LTD (JP)
KAWAZU MITSUHIRO (JP)

C03C17/00; C09D1/00; C09D5/32; C09D5/38; G02B5/22; (IPC1-7): C03C17/25; C04B41/87; G02B5/22; B32B17/10; C09D1/00; C09D5/00

JPS4716816B1	1972-05-17
JPH06191896A	1994-07-12
JPH09278488A	1997-10-28
JP2000272935A	2000-10-03

H. YANAGI ET AL.: "Photoresponsive formation of gold particles in silica/titania sol-gel films", CHEM. MATER., vol. 10, no. 5, May 1998 (1998-05-01), pages 1258 - 1264, XP002935447

Matsunaga, Takayoshi (Nihonbashi 3-chome Chuo-ku, Tokyo, JP)

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