Title:
METHOD FOR PREPARING THIN FILM TRANSISTOR, AND METHOD FOR PREPARING DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2018/149000
Kind Code:
A1
Abstract:
Provided are a method for preparing a thin film transistor, and a method for preparing a display panel. In the method, a semiconductor channel layer (250) is formed by means of directly imprinting, on a semiconductor solution material (230), an imprint template (240) having a recess portion (241) with a pattern of the semiconductor channel layer (250). Therefore, it is not necessary to form a photoresist on the semiconductor solution material (230) so as to form the semiconductor channel layer (250), and thus, the erosion of the photoresist on the semiconductor channel layer (250) can be prevented, thereby facilitating the improvement of product quality and the improvement of device performance.
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Inventors:
LIU ZHE (CN)
Application Number:
PCT/CN2017/076314
Publication Date:
August 23, 2018
Filing Date:
March 10, 2017
Export Citation:
Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L21/336; H01L21/77
Foreign References:
| CN105140178A | 2015-12-09 | |||
| US20050008880A1 | 2005-01-13 | |||
| TW299527B | 1997-03-01 | |||
| CN1905131A | 2007-01-31 | |||
| CN102144188A | 2011-08-03 | |||
| CN103236442A | 2013-08-07 | |||
| CN102066424A | 2011-05-18 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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