Title:
METHOD FOR PROCESSING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/055881
Kind Code:
A1
Abstract:
Provided is a method, in which a substrate is mounted on a holding plate incorporating a pre-heating mechanism, and pre-heated. On the substrate, a film to be processed is formed, with the film being composed of an induction self-organizing material. The atmosphere around the substrate is a low oxygen atmosphere. The pre-heating temperature is set to be a temperature at which the induction self-organizing material constituted of two types of polymers causes phase separation. By pre-heating the film to be processed, the two-types of polymers causes phase separation and fine patterns are formed. By irradiating the film to be processed with flash light from a flash lamp while pre-heating the film, fluidity of polymers that constitutes the film is increased, and fine patterns can be formed while suppressing occurrence of defects.
Inventors:
YAMADA TAKAHIRO (JP)
HARUMOTO MASAHIKO (JP)
TANAKA YUJI (JP)
HARUMOTO MASAHIKO (JP)
TANAKA YUJI (JP)
Application Number:
PCT/JP2017/025747
Publication Date:
March 29, 2018
Filing Date:
July 14, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B82Y30/00; G03F7/40
Foreign References:
| JP2015179272A | 2015-10-08 | |||
| US20140178824A1 | 2014-06-26 | |||
| JP2014053558A | 2014-03-20 | |||
| JP2014022570A | 2014-02-03 | |||
| JP2013228492A | 2013-11-07 | |||
| JP2013160621A | 2013-08-19 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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