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Title:
METHOD FOR PRODUCING ALUMINIUM FOIL
Document Type and Number:
WIPO Patent Application WO/2012/063920
Kind Code:
A1
Abstract:
The object of the present invention is to provide a method for producing high-purity aluminium foil having excellent tensile strength that is maintained even after exposure to high temperatures, and which makes it possible for accumulator devices to be miniaturized and the film thickness of cathode collectors to be reduced in order to increase energy density. As a means of solving this problem, the method for producing aluminium foil of the present invention is characterized by forming an aluminum film on the surface of a base material by electrolysis using a plating solution containing at least the following: (1) a dialkyl sulfone, (2) an aluminum halide, and (3) at least one nitrogen-containing compound selected from a group consisting of an ammonium halide, a hydrogen halide of a primary amine, a hydrogen halide of a secondary amine, a hydrogen halide of a tertiary amine, and a quaternary ammonium salt represented by general formula: R1R2R3R4N⋅X (R1 to R4 represent the same or different alkyl groups, and X represents a counter ion to quaternary ammonium cations). Said film is subsequently peeled from the substrate to obtain aluminum foil, and the aluminum foil thus obtained is subjected to heat treatment.

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Inventors:
OKAMOTO ATSUSHI (JP)
HOSHI HIROYUKI (JP)
ANDOU SETSUO (JP)
Application Number:
PCT/JP2011/075996
Publication Date:
May 18, 2012
Filing Date:
November 10, 2011
Export Citation:
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Assignee:
HITACHI METALS LTD (JP)
OKAMOTO ATSUSHI (JP)
HOSHI HIROYUKI (JP)
ANDOU SETSUO (JP)
International Classes:
C25D1/04; C25D1/00; H01G11/22; H01G11/84; H01M4/66
Domestic Patent References:
WO2010044305A12010-04-22
Foreign References:
JP2010090414A2010-04-22
JPH01104791A1989-04-21
JP2001516812A2001-10-02
JP2005121825A2005-05-12
JPH08501831A1996-02-27
JPH01104791A1989-04-21
JP2008031551A2008-02-14
JPH0693490A1994-04-05
Other References:
See also references of EP 2639341A4
Attorney, Agent or Firm:
TSUJITA Takashi et al. (JP)
Yukifumi Tsujita (JP)
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