Title:
METHOD FOR PRODUCING GLASS SUBSTRATE, PRETREATMENT METHOD FOR GLASS SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER BODY COMPRISING GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2023/058368
Kind Code:
A1
Abstract:
The present invention provides a method that is capable of forming a good pattern by making a large difference in the developer solution solubility between a light-exposed part and a non-light-exposed part in cases where a radiation sensitive resin film, which is formed on a glass substrate with use of a chemically amplified radiation sensitive resin film-forming composition that generates an acid upon exposure to light, is exposed to light and is subsequently developed. The present invention also provides a method for producing a glass substrate, the method comprising a pretreatment step in which a glass substrate is treated with an acid before patterning a radiation sensitive resin film, which is formed on the glass substrate, by means of irradiation of light or electron beams and subsequent development.
Inventors:
KISHIOKA TAKAHIRO (JP)
Application Number:
PCT/JP2022/032827
Publication Date:
April 13, 2023
Filing Date:
August 31, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/38; G03F1/60; G03F1/82; G03F7/038; G03F7/20
Foreign References:
| JP2015101500A | 2015-06-04 | |||
| JP2008256754A | 2008-10-23 |
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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