Title:
RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/058369
Kind Code:
A1
Abstract:
Provided are a radiation-sensitive resin composition, a resin, a compound, and a pattern formation method with which it is possible to form a resist film that has excellent sensitivity, CDU performance, and resolution when next-generation technology is applied. A radiation-sensitive resin composition that includes: a resin including a structural unit (I) represented by formula (1); a radiation-sensitive acid generator including an organic acid anion moiety and an onium cation moiety; and a solvent. (In formula (1), Ra is a hydrogen atom or a substituted or unsubstituted C1-10 monovalent hydrocarbon group. Ar1 is a substituted or unsubstituted C6-20 divalent aromatic hydrocarbon group. m is 0 or 1. L1 is -O-, *-COO-, a C1-20 divalent hydrocarbon group, or a combination of two or more thereof or is a single bond. * is a bond on the Ar1 side. Ar2 is a substituted or unsubstituted C6-20 monovalent aromatic hydrocarbon group. X is a an iodine atom or bromine atom substituting a hydrogen atom in a monovalent aromatic hydrocarbon group represented by Ar2. When multiple X are present, the multiple X are the same as or different from each other. n1 is an integer of 1 to (the number of hydrogen atoms in a monovalent aromatic hydrocarbon group represented by Ar2).)
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Inventors:
NISHIKORI KATSUAKI (JP)
KIRIYAMA KAZUYA (JP)
KINOSHITA NATSUKO (JP)
TANIGUCHI TAKUHIRO (JP)
OMIYA TAKUYA (JP)
KIRIYAMA KAZUYA (JP)
KINOSHITA NATSUKO (JP)
TANIGUCHI TAKUHIRO (JP)
OMIYA TAKUYA (JP)
Application Number:
PCT/JP2022/032972
Publication Date:
April 13, 2023
Filing Date:
September 01, 2022
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F220/12; C08F220/22; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| WO2020099190A1 | 2020-05-22 |
Foreign References:
| JP2019008280A | 2019-01-17 | |||
| JP2018197853A | 2018-12-13 | |||
| JPS6315821A | 1988-01-22 | |||
| JPS58179801A | 1983-10-21 | |||
| JP5220969B2 | 2013-06-26 | |||
| JP2000356702A | 2000-12-26 |
Other References:
GHANNAY SIWAR; BAKARI SANA; MSADDEK MONCEF; VIDAL SéBASTIEN; KADRI ADEL; AOUADI KAïSS: "Design, synthesis, molecular properties and in vitro antioxidant and antibacterial potential of novel enantiopure isoxazolidine derivatives", ARABIAN JOURNAL OF CHEMISTRY, vol. 13, no. 1, 3 April 2018 (2018-04-03), AMSTERDAM, NL , pages 2121 - 2131, XP086032974, ISSN: 1878-5352, DOI: 10.1016/j.arabjc.2018.03.013
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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