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Title:
METHOD FOR PRODUCING GLASS SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2012/132449
Kind Code:
A1
Abstract:
This method for producing a glass substrate for a liquid crystal display device comprises: a raw material formulation step for using at least a silica raw material having SiO2 as a main ingredient and an adjustment raw material comprising iron oxide to prepare a formulation and make a glass raw material; a melting step for melting the glass raw material and generating molten glass; and a clarification step for clarifying the generated molten glass. The silica raw material comprises iron oxide as an impurity, and, where the iron oxide is represented by Fe2O3, the silica raw material comprises at most 0.001-0.028 mass% Fe2O3. The content of the adjustment raw material within the glass raw material is adjusted such that the transmittance for a wavelength of 300 nm in the glass substrate for the liquid crystal display device reaches at least 30%.

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Inventors:
KOYAMA AKIHIRO (JP)
OSHIMA SATSUKI (JP)
Application Number:
PCT/JP2012/002180
Publication Date:
October 04, 2012
Filing Date:
March 29, 2012
Export Citation:
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Assignee:
AVANSTRATE INC (JP)
KOYAMA AKIHIRO (JP)
OSHIMA SATSUKI (JP)
International Classes:
C03B1/00; C03B5/225; C03C3/091
Domestic Patent References:
WO2006080444A12006-08-03
Foreign References:
JP2010509180A2010-03-25
JP2011042556A2011-03-03
JP2010254530A2010-11-11
Attorney, Agent or Firm:
GLOBAL IP TOKYO (JP)
Global IP Tokyo patent business corporation (JP)
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