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Title:
METHOD FOR PRODUCING LONG POLISHING PAD
Document Type and Number:
WIPO Patent Application WO/2008/047631
Kind Code:
A1
Abstract:
Disclosed is a method for producing a long polishing pad, which is capable of preventing slurry leakage and excellent in optical detection accuracy, with high productivity. Specifically disclosed is a method for producing a long polishing pad, which comprises a step for forming a long polishing unit (9) made of a polyurethane foam, a step for forming an opening, which is composed of a through hole (12) and a shelf portion (13), in the long polishing unit (9), a step for forming a convex-shaped long light-transmitting unit (10) which is thinner than the long polishing unit (9), a step for arranging the long light-transmitting unit (10) in the opening of the long polishing unit, and a step for bonding a transparent supporting film (11) on the rear surface of the long polishing unit.

Inventors:
NAKAI YOSHIYUKI (JP)
KIMURA TSUYOSHI (JP)
SHIMOMURA TETSUO (JP)
FUKUDA TAKESHI (JP)
OGAWA KAZUYUKI (JP)
Application Number:
PCT/JP2007/069685
Publication Date:
April 24, 2008
Filing Date:
October 09, 2007
Export Citation:
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Assignee:
TOYO TIRE & RUBBER CO (JP)
NAKAI YOSHIYUKI (JP)
KIMURA TSUYOSHI (JP)
SHIMOMURA TETSUO (JP)
FUKUDA TAKESHI (JP)
OGAWA KAZUYUKI (JP)
International Classes:
B24B37/20; B29C39/02; B29C39/10; B29C65/48; H01L21/304; B29K75/00
Foreign References:
JP2003133270A2003-05-09
JP2004327974A2004-11-18
JP2004343090A2004-12-02
JPH07178739A1995-07-18
JP2007260827A2007-10-11
JP2007260801A2007-10-11
Attorney, Agent or Firm:
OZAKI, Yuzo et al. (13-9 Nishinakajima 5-chome, Yodogawa-k, Osaka-shi Osaka 11, JP)
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